Y.B. Kafai: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Resist profile simulation with fast lithography model

Lai, Kafai, Erdmann, Andreas, He, Yan-Ying, Chou, Chih-Shiang, Tang, Yu-Po, Huang, Wen-Chun, Liu, Ru-Gun, Gau, Tsai-Sheng

Year:

2014

Language:

english

File:

PDF, 936 KB

english, 2014

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Low-contrast photoresist development model for OPC application at 10nm node

Lai, Kafai, Erdmann, Andreas, Wu, Cheng-En, Wei, David, Zhang, Charlie, Song, Hua

Year:

2015

Language:

english

File:

PDF, 457 KB

english, 2015

3

Pharmacotherapy for Small Fiber Neuropathy

George, Tikku, Kafaie, Jafar, Huang, Zi Ling, Profirovic, Jasmina

Journal:

Current Treatment Options in Neurology

Year:

2020

File:

PDF, 311 KB

2020

4

Your Second Selves: Player-Designed Avatars

Kafai, Y. B., Fields, D. A., Cook, M. S.

Journal:

Games and Culture

Year:

2010

Language:

english

File:

PDF, 675 KB

english, 2010

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Photoresist 3D profile related etch process simulation and its application to full chip etch compact modeling

Lai, Kafai, Erdmann, Andreas, Wu, Cheng-En, Yang, Wayne, Luan, Lan, Song, Hua

Year:

2015

Language:

english

File:

PDF, 337 KB

english, 2015

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Improving 3D resist profile compact modeling by exploiting 3D resist physical mechanisms

Lai, Kafai, Erdmann, Andreas, Fan, Yongfa, Wu, Cheng-En R., Ren, Qian, Song, Hua, Schmoeller, Thomas

Year:

2014

Language:

english

File:

PDF, 415 KB

english, 2014

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Lithographic process window optimization for mask aligner proximity lithography

Lai, Kafai, Erdmann, Andreas, Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Erdmann, Andreas, Ünal, Nezih, Hofmann, Ulrich, Hennemeyer, Marc, Zoberbier, Ralph, Nguyen, David, Brugger, Juergen

Year:

2014

Language:

english

File:

PDF, 1.01 MB

english, 2014

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Experimental validation of rigorous, 3D profile models for negative-tone develop resists

Lai, Kafai, Erdmann, Andreas, Gao, Weimin, Klostermann, Ulrich, Kamohara, Itaru, Schmoeller, Thomas, Lucas, Kevin, Demmerle, Wolfgang, De Bisschop, Peter, Mailfert, Julien

Year:

2014

Language:

english

File:

PDF, 960 KB

english, 2014

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Immersion and dry scanner extensions for sub-10nm production nodes

Lai, Kafai, Erdmann, Andreas, Weichselbaum, Stefan, Bornebroek, Frank, de Kort, Toine, Droste, Richard, de Graaf, Roelof F., van Ballegoij, Rob, Botter, Herman, McLaren, Matthew G., de Boeij, Wim P.

Year:

2015

Language:

english

File:

PDF, 7.08 MB

english, 2015

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Evaluation of compact models for negative-tone development layers at 20/14nm nodes

Lai, Kafai, Erdmann, Andreas, Chen, Ao, Foong, Yee Mei, Zhang, Dong Qing, Zhang, Hongxin, Chung, Angeline, Fryer, David, Deng, Yunfei, Medvedev, Dmitry, Granik, Yuri

Year:

2015

Language:

english

File:

PDF, 1.04 MB

english, 2015

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Process window enhancement using advanced RET techniques for 20nm contact layer

Lai, Kafai, Erdmann, Andreas, Ping, Yang, McGowan, Sarah, Gong, Ying, Foong, Yee Mei, Liu, Jian, Qiu, Jianhong, Shu, Vincent, Yan, Bo, Ye, Jun, Li, Pengcheng, Zhou, Hui, Pandey, Taksh, Liang, Jiao, Aq

Year:

2014

Language:

english

File:

PDF, 3.19 MB

english, 2014

12

Application of Dublin Core metadata in the description of digital primary sources in elementary school classrooms

Anne J. Gilliland-Swetland, Yasmin B. Kafai, William E. Landis

Journal:

Journal of the American Society for Information Science and Technology

Year:

2000

Language:

english

File:

PDF, 80 KB

english, 2000

13

Exploiting sub-20-nm complementary metal-oxide semiconductor technology challenges to design affordable systems-on-chip

Vaidyanathan, Kaushik, Zhu, Qiuling, Liebmann, Lars, Lai, Kafai, Wu, Stephen, Liu, Renzhi, Liu, Yandong, Strojwas, Andzrej, Pileggi, Larry

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2014

Language:

english

File:

PDF, 11.78 MB

english, 2014

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Modeling the lithography of ion implantation resists on topography

Lai, Kafai, Erdmann, Andreas, Winroth, Gustaf, Vaglio Pret, Alessandro, Ercken, Monique, Robinson, Stewart A., Biafore, John J.

Year:

2014

Language:

english

File:

PDF, 2.30 MB

english, 2014

15

Electronic Textiles as Disruptive Designs: Supporting and Challenging Maker Activities in Schools

Kafai, Yasmin, Fields, Deborah, Searle, Kristin

Journal:

Harvard Educational Review

Year:

2014

Language:

english

File:

PDF, 2.18 MB

english, 2014

16

Making more of games: Cultivating perspective-taking through game design

Dishon, Gideon, Kafai, Yasmin B.

Journal:

Computers & Education

Year:

2020

File:

PDF, 1.44 MB

2020

17

Children as designers of educational multimedia software

Yasmin B. Kafai, Cynthia Carter Ching, Sue Marshall

Journal:

Computers & Education

Year:

1997

Language:

english

File:

PDF, 889 KB

english, 1997

18

Reference Face Graph for Face Recognition

Kafai, Mehran, An, Le, Bhanu, Bir

Journal:

IEEE Transactions on Information Forensics and Security

Year:

2014

Language:

english

File:

PDF, 8.63 MB

english, 2014

19

Design implications of extremely restricted patterning

Vaidyanathan, Kaushik, Liu, Renzhi, Liebmann, Lars, Lai, Kafai, Strojwas, Andzrej J., Pileggi, Larry

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2014

Language:

english

File:

PDF, 9.58 MB

english, 2014

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Novel wafer stepper with violet LED light source

Lai, Kafai, Erdmann, Andreas, Ting, Yung-Chiang, Shy, Shyi-Long

Year:

2014

Language:

english

File:

PDF, 226 KB

english, 2014

21

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Overlay improvement methods with diffraction based overlay and integrated metrology

Lai, Kafai, Erdmann, Andreas, Nam, Young-Sun, Kim, Sunny, Shin, Ju Hee, Choi, Young Sin, Yun, Sang Ho, Kim, Young Hoon, Shin, Si Woo, Kong, Jeong Heung, Kang, Young Seog, Ha, Hun Hwan

Year:

2015

Language:

english

File:

PDF, 885 KB

english, 2015

22

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - A stochastic approach to SRAF printing prediction

Lai, Kafai, Erdmann, Andreas, Lutich, Andrey

Year:

2014

Language:

english

File:

PDF, 590 KB

english, 2014

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Topographic and other effects on EUV pattern fidelity

Lai, Kafai, Erdmann, Andreas, Sarma, Chandra, Graves, Trey, Neisser, Mark, Robertson, Stewart

Year:

2014

Language:

english

File:

PDF, 1004 KB

english, 2014

24

From computational thinking to computational participation in K--12 education

Kafai, Yasmin B.

Journal:

Communications of the ACM

Year:

2016

Language:

english

File:

PDF, 1.52 MB

english, 2016

25

Design technology co-optimization assessment for directed self-assembly-based lithography: design for directed self-assembly or directed self-assembly for design?

Lai, Kafai, Liu, Chi-Chun, Tsai, Hsinyu, Xu, Yongan, Chi, Cheng, Raghunathan, Ananthan, Dhagat, Parul, Hu, Lin, Park, Oseo, Jung, Sunggon, Cho, Wooyong, Morillo, Jaime, Pitera, Jed, Schmidt, Kristin,

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2017

Language:

english

File:

PDF, 10.49 MB

english, 2017

26

STEAM Maker Education: Conceal/Reveal of Personal, Artistic and Computational Dimensions in High School Student Projects

Lindberg, Lindsay, Fields, Deborah Ann, Kafai, Yasmin B.

Journal:

Frontiers in Education

Year:

2020

File:

PDF, 2.41 MB

2020

27

Dynamic Bayesian Network for Unconstrained Face Recognition in Surveillance Camera Networks

An, Le, Kafai, Mehran, Bhanu, Bir

Journal:

IEEE Journal on Emerging and Selected Topics in Circuits and Systems

Year:

2013

Language:

english

File:

PDF, 2.40 MB

english, 2013

28

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Focus shift impacted by mask 3D and comparison between Att. PSM and OMOG

Lai, Kafai, Erdmann, Andreas, Liu, Yansong, Su, Xiaojing, Dong, LiSong, Song, Zhiyang, Guo, Moran, Su, Yajuan, Wei, Yayi

Year:

2015

Language:

english

File:

PDF, 893 KB

english, 2015

29

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Full-chip model-based OPC verification by using rigorous resist 3D model

Lai, Kafai, Erdmann, Andreas, Kong, Dongho, You, Taejun, Kim, Cheolkyun, Yang, Hyunjo, Yim, Donggyu

Year:

2014

Language:

english

File:

PDF, 742 KB

english, 2014

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Calibrating etch model with SEM contours

Lai, Kafai, Erdmann, Andreas, Weisbuch, François, Omran, A., Jantzen, Kenneth

Year:

2015

Language:

english

File:

PDF, 1.20 MB

english, 2015

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Comparing the experimental resist image with aerial image intensity in high-NA projection lense

Lai, Kafai, Erdmann, Andreas, Shibuya, Masato, Takada, Akira, Nakashima, Toshiharu

Year:

2015

Language:

english

File:

PDF, 611 KB

english, 2015

32

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - An improved virtual aberration model to simulate mask 3D and resist effects

Lai, Kafai, Erdmann, Andreas, Kanaya, Reiji, Fujii, Koichi, Imai, Motokatsu, Matsuyama, Tomoyuki, Tsuzuki, Takao, Lin, Qun Ying

Year:

2015

Language:

english

File:

PDF, 506 KB

english, 2015

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Investigating deprotection-induced shrinkage and retro-grade sidewalls in NTD resists

Lai, Kafai, Erdmann, Andreas, Pistor, Thomas V., Wang, Chenchen, Wang, Yan, Yuan, Lei, Kye, Jongwook, Wu, Yixu, Mehta, Sohan, Ackmann, Paul

Year:

2015

Language:

english

File:

PDF, 1.20 MB

english, 2015

34

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Rigorous wafer topography simulation for investigating wafer alignment quality and robustness

Lai, Kafai, Erdmann, Andreas, Morgana, Nicoló, Gavrilin, Dmitrii, Greiner, Andreas, Hofmann, Detlef, Kamohara, Itaru, Klostermann, Ulrich, Moeller, Holger, Preuninger, Juergen

Year:

2015

Language:

english

File:

PDF, 12.71 MB

english, 2015

35

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - The study of lithography conditions to use advanced resist performance properly

Lai, Kafai, Erdmann, Andreas, Yang, Zhengkai, Wang, Wuping, Chen, Quan, Aoyama, Hajime, Takemasa, Kengo, Sei, Toshihiko, Miyazawa, Tami, Matsuyama, Tomoyuki, Shao, Chun

Year:

2015

Language:

english

File:

PDF, 1004 KB

english, 2015

36

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Accurate and fast computation of transmission cross coefficients

Lai, Kafai, Erdmann, Andreas, Apostol, Ştefan, Hurley, Paul, Ionescu, Radu-Cristian

Year:

2015

Language:

english

File:

PDF, 1.82 MB

english, 2015

37

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography

Lai, Kafai, Erdmann, Andreas, Bourgin, Yannick, Siefke, Thomas, Käsebier, Thomas, Kley, Ernst-Bernhard, Zeitner, Uwe D.

Year:

2015

Language:

english

File:

PDF, 1.11 MB

english, 2015

38

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Hybrid OPC modeling with SEM contour technique for 10nm node process

Lai, Kafai, Erdmann, Andreas, Hitomi, Keiichiro, Halle, Scott, Miller, Marshal, Graur, Ioana, Saulnier, Nicole, Dunn, Derren, Okai, Nobuhiro, Hotta, Shoji, Yamaguchi, Atsuko, Komuro, Hitoshi, Ishimoto

Year:

2014

Language:

english

File:

PDF, 867 KB

english, 2014

39

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Total source mask optimization: high-capacity, resist modeling, and production-ready mask solution

Fakhry, Moutaz, Maurer, Wilhelm, Abboud, Frank E., Granik, Yuri, Adam, Kostas, Lai, Kafai

Year:

2011

Language:

english

File:

PDF, 1.79 MB

english, 2011

40

Rickettsia Sca4 Reduces Vinculin-Mediated Intercellular Tension to Promote Spread

Lamason, Rebecca L., Bastounis, Effie, Kafai, Natasha M., Serrano, Ricardo, del Álamo, Juan C., Theriot, Julie A., Welch, Matthew D.

Journal:

Year:

2016

Language:

english

File:

PDF, 6.23 MB

english, 2016

41

The contribution of leg press and knee extension strength and power to physical function in people with knee osteoarthritis: A cross-sectional study

Tevald, Michael A, Murray, Amanda M, Luc, Brittney, Lai, Kafai, Sohn, David, Pietrosimone, Brian

Journal:

Year:

2016

Language:

english

File:

PDF, 302 KB

english, 2016

42

Building a Home for the Maker Movement

Kafai, Yasmin B.

Journal:

Journal of Digital Learning in Teacher Education

Year:

2018

Language:

english

File:

PDF, 327 KB

english, 2018

43

Constructionist visions: Hard fun with serious games

Kafai, Yasmin B.

Journal:

International Journal of Child-Computer Interaction

Year:

2018

Language:

english

File:

PDF, 146 KB

english, 2018

44

The ethics of play and participation in a tween virtual world: Continuity and change in cheating practices and perspectives in the Whyville community

Kafai, Yasmin B., Fields, Deborah A., Ellis, Estee

Journal:

Cognitive Development

Year:

2019

Language:

english

File:

PDF, 778 KB

english, 2019

45

Glycemic load is associated with HDL cholesterol but not with the other components and prevalence of metabolic syndrome in the third National Health and Nutrition Examination Survey, 1988–1994

Amy Culberson, Mohammad R Kafai, Vijay Ganji

Journal:

International Archives of Medicine

Year:

2009

Language:

english

File:

PDF, 177 KB

english, 2009

46

A connective ethnography of peer knowledge sharing and diffusion in a tween virtual world

Deborah A. Fields, Yasmin B. Kafai

Journal:

International Journal of Computer-Supported Collaborative Learning

Year:

2009

Language:

english

File:

PDF, 314 KB

english, 2009

47

Game Design as an Interactive Learning Environment for Fostering Students' and Teachers' Mathematical Inquiry

Y.B. Kafai, M.L. Franke, C.C. Ching, J.C. Shih

Journal:

Technology, Knowledge and Learning

Year:

1998

Language:

english

File:

PDF, 231 KB

english, 1998

48

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Optical Microlithography XXII - Intensive optimization of masks and sources for 22nm lithography

Rosenbluth, Alan E., Melville, David O., Tian, Kehan, Bagheri, Saeed, Tirapu-Azpiroz, Jaione, Lai, Kafai, Waechter, Andreas, Inoue, Tadanobu, Ladanyi, Laszlo, Barahona, Francisco, Scheinberg, Katya, S

Year:

2009

Language:

english

File:

PDF, 1.45 MB

english, 2009

49

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - New paradigm in lens metrology for lithographic scanner: evaluation and exploration

Lai, Kafai, Gallatin, Gregg M., van de Kerkhof, Mark A., de Boeij, Wim, Kok, Haico, Schriever, Martin, Morillo, Jaime D., Fair, Robert H., Bennett, Stephanie, Corliss, Daniel A., Smith, Bruce W.

Year:

2004

Language:

english

File:

PDF, 294 KB

english, 2004

50

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, CA (Sunday 22 February 2009)] Optical Microlithography XXII - Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Lai, Kafai, Rosenbluth, Alan E., Bagheri, Saeed, Hoffnagle, John, Tian, Kehan, Melville, David, Tirapu-Azpiroz, Jaione, Fakhry, Moutaz, Kim, Young, Halle, Scott, McIntyre, Greg, Wagner, Alfred, Burr,

Year:

2009

File:

PDF, 6.44 MB

2009